Chemical Peels: Renewing Your Skin

Often times, people hear the phrase “chemical peel” and shudder. Chemicals should never be applied to the face right? Well, if it’s done correctly with doctor supervision, chemical peels can be extremely effective in fighting the signs of aging including fine lines, wrinkles, scarring and dark spots.

Put simply, a chemical peel uses a chemical solution to exfoliate dead skin cells, resulting in a smoother surface area. The two main types of chemical peels are Alphahydroxy and Betahydroxy, and choosing the correct one for you depends on the results that you are looking to obtain.

Alphahydroxy (AHA) Chemical Peel are light peels that are generally used to reduce fine lines and wrinkles, smooth rough, dry skin, reduce uneven pigmentation, aid in the control of acne and improve the texture of sun damaged skin. Generally, glycolic acid, which is found naturally in sugar cane, is used as the agent of choice and is the most common ingredient of light chemical peels. AHA Peels are safe and effective to unclog pores, eliminate dead skin cells and effectively improve the skin’s overall appearance.

Betahydroxy (BHA) Chemical Peels are able to penetrate the skin’s pores deeper than an AHA peel and are effective in controlling oil and acne and exfoliating dead cells from the skin’s surface. Salicylic acid is the most common active ingredient found in BHA Peels and is very effective in treating blemish-prone skin, prematurely aged and sun damaged skin as well as improving skin’s texture and tone.

While there are many safe and effective over the counter chemical peel products, none are as effective as the peel that you can receive in a doctor’s office. The Peer Group Skin Center uses medical grade Skinceutical Biomedic products in our chemical peel treatments, allowing us to effectively treat your skin, providing fast and painless results.

For more information on chemical peels, or to schedule an appointment for a chemical peel please contact The Peer Group Skin Center in Florham Park, NJ.